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Tungsten silicide, 99.5% (metals basis), Thermo Scientific Chemicals
Descrizione
Tungsten silicide is used in microelectronics as a contact material. It is also used as a shunt over polysilicon lines to increase their conductivity and increase signal speed. Further, it acts as a barrier layer between silicon and other metals. In addition to this, it is used in microelectro mechanical systems and for oxidation-resistant coatings. It is also employed as a replacement for earlier tungsten films.
This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

Specifica
Specifica
Materiale o nome chimico | Tungsten silicide |
Punto di fusione | 2165°C |
Forma fisica | Powder |
Quantità | 10 g |
Note percentuale saggio | (metals basis) |
Informazioni di solubilità | Insoluble in water. |
Peso formulazione | 240.02 |
Percent Purity | 99.5% |
Odore | Odorless |
RUO – Research Use Only
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