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Manganese sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
Descrizione
Manganese sputtering target is widely used in coating processing industries like magnetic data storage application, electronic and semiconductor application. It is used also in chemical vapor deposition (CVD), physical vapor deposition (PVD) display and optical applications.
This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.
Specifica
Specifica
| Materiale o nome chimico | Manganese sputtering target |
| Nota nome | 76.2mm (3.0 in.) dia. x 3.18mm (0.125 in.) thick |
| Quantità | 1 Ea. |
| CAS | 7439-96-5 |
| Forma | Hot Pressed |
| Odore | Odorless |
| Note percentuale saggio | (metals basis) |
| Formula molecolare | Mn |
| Numero MDL | MFCD00011111 |
| Sinonimo | colloidal, mangan, manganese, elemental, cutaval, magnacat, metal alloy, tronamang, fume, mangan polish, compounds |
| Vedi altri risultati |
RUO – Research Use Only
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